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Early stage formation of graphene on the C-face of 6H-SiC

机译:在6H-siC的C面上早期形成石墨烯

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摘要

An investigation of the early stage formation of graphene on the C-face of6H-SiC is presented. We show that the sublimation of few atomic layers of Siout of the SiC substrate is not homogeneous. In good agreement with the resultsof theoretical calculations it starts from defective sites, mainly dislocationsthat define nearly circular flakes, which have a pyramidal, volcano-like, shapewith a center chimney where the original defect was located. At highertemperatures, complete conversion occurs but, again, it is not homogeneous.Within the sample surface the intensity of the Raman G and 2D bands, evidencesnon-homogeneous thickness.
机译:提出了在6H-SiC C面上石墨烯早期形成的研究。我们表明,SiC衬底Siout的几个原子层的升华不是均匀的。与理论计算结果完全吻合的是,它是从缺陷部位开始的,主要是位错,这些位错定义了近乎圆形的薄片,这些薄片具有金字塔状,火山状的形状,中心烟囱位于原始缺陷所在的位置。在更高的温度下,会发生完全转化,但又是不均匀的。在样品表面内,拉曼G和2D谱带的强度表明厚度不均匀。

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